Abstract

ZnO is widely used in solar cells, gas sensors, photodetectors due to its wonderful physicochemical properties, cost effectiveness, high transmittance and wide optical band gap. A chemical bath deposition (CBD) is attracting attention as low-cost film formation processes. In these processes, nucleation and crystal growth on substrate in solution result in the formation of metal-oxide films. We present a fundamental experimental study of a microwave assisted chemical bath deposition (MW-CBD) method for Al doped ZnO films. The MW-CBD method was used to prepare nanostructure Al doped ZnO films onto p-Si substrates. Zinc nitrate hexahydrate and aluminum nitrate nonahydrate were the precursor materials and doping source materials. Scanning electron microscopy (SEM) and X-ray diffraction (XRD) spectroscopy were used to analyze the microstructures and crystalline structures of these films, respectively